Line width roughness

{
  "id": "MLC-T-CHM-006611",
  "term": "Line width roughness",
  "field": "Chemistry",
  "definition": "The statistical deviation of a lithographically patterned line's width from its average value, measured along the line's length. This variation arises from factors like shot noise in the exposure process, acid diffusion in chemically amplified resists, and the molecular size of the polymer. Line width roughness is quantified as three times the standard deviation (3σ) of the line width and is a key metric for the quality of a lithographic process.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1876 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/line-width-roughness/"
}