Sputter depth profile

{
  "id": "MLC-T-CHM-011252",
  "term": "Sputter depth profile",
  "field": "Chemistry",
  "definition": "A technique in surface analysis where material is progressively removed from a sample surface by ion bombardment, and the elemental composition is measured as a function of depth. This process generates a profile showing the concentration of specific elements at different depths within the material. It is widely used in techniques like secondary-ion mass spectrometry (SIMS) and Auger electron spectroscopy.",
  "subject": "Analytical Chemistry",
  "see_also": [
    "ion beam",
    "secondary-ion mass spectrometry"
  ],
  "references": [
    "PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1813 (https://doi.org/10.1515/pac-2019-0404)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/sputter-depth-profile/"
}