Double exposure

{
  "id": "MLC-T-CHM-003404",
  "term": "Double exposure",
  "field": "Chemistry",
  "definition": "A lithographic technique where a resist-coated substrate is exposed to radiation twice, either with different patterns or different doses. This method allows for the creation of complex three-dimensional structures or patterns with enhanced resolution. It is employed in advanced photolithography to overcome limitations of single exposure processes.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1872 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/double-exposure/"
}