Dual-beam profiling

{
  "id": "MLC-T-CHM-003469",
  "term": "Dual-beam profiling",
  "field": "Chemistry",
  "definition": "A secondary-ion mass spectrometry mode for sputter depth profiling that uses two ion guns. In time-of-flight instruments one gun delivers short pulses for the mass analysis while the other removes material between analysis cycles, so the sputter conditions and the analysis conditions are set independently. Two similar guns placed at opposite azimuths are also used to reduce the growth of surface topography.",
  "subject": "Analytical Chemistry",
  "see_also": [
    "depth profiling",
    "secondary-ion mass spectrometry",
    "sputtering rate"
  ],
  "references": [
    "PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1838 (https://doi.org/10.1515/pac-2019-0404)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/dual-beam-profiling/"
}